A measurement aperture mask with electrochemically-etched holes to define the active area of a pixel duringmeasurement and to stop indirect/scattered light when using our push-fit connection boards. Useful for OPVmeasurements under solar simulators or OLEDs with luminance meters. For use with our . Comes in either8-pixel or single-pixel form.
Looking for generation I (E141/2) or II (E361/2/3) aperture masks for S101 or S171 substrates?
We have discontinued our generation I and generation II substrates and masks. The replacement8-pixel design allows you to create either eight small individual pixels or a single large pixel. for more information,technical support and advice, or for help migrating to the new system.
Mask Specifications
8-Pixel
| Apertures | 8 x 2.56 mm2 |
| Aperture tolerance | ±5% |
| Outer dimensions | 15 mm x 20 mm x 0.2 mm |
Measurement aperture mask (left). Technical drawing (right)
Single-Pixel
| Aperture | 40.05 mm 2 |
| Aperture tolerance | ±5% |
| Outer dimensions | 15 mm x 20 mm x 0.2 mm |
Measurement aperture (left). Technical drawing (right)
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